Etch Silicon Nitride Layer.

STEP 1: HF (50:1) - PVDF or Natural Polypro Ambient Static Bath

STEP 2: Rinse - PVDF QDR Bath

STEP 3: Phosphoric Acid - Quartz Nitride Etch

STEP 4: Rinse - PVDF QDR Bath

STEP 5: SC1 - Quartz Heated Filtered Bath / Optional Megasonics

STEP 6: Rinse - PVDF QDR Bath

STEP 7: Dry - IPA Vapor Dryer

Removal of light organics, silicon dioxide layer, and metals.

STEP 1: HF (50:1) - PVDF or Natural Polypro Ambient Static Bath

STEP 2: Rinse - PVDF QDR Bath

STEP 3: SC2 - Quartz Heated Filtered Bath

STEP 4: Rinse - PVDF QDR Bath

STEP 5: Dry -IPA Vapor Dryer

Removal of light organics, particles, and silicon dioxide layer.

STEP 1: SC1 - Quartz Heated Filtered Bath / Optional Megasonics

STEP 2: Rinse - PVDF QDR Bath

STEP 3: HF (50:1) - PVDF or Natural Polypro Ambient Static Bath

STEP 4: Rinse - PVDF QDR Bath

STEP 5: Dry - IPA Vapor Dryer

Silicon etch, Polysilicon etch, Silicon Dioxide removal.

STEP 1: HF - PVDF Constant Temperature Bath

STEP 2: Rinse - PVDF QDR Bath

STEP 3: BOE - PVDF Constant Temperature Bath

STEP 4: Rinse - PVDF QDR Bath

STEP 5: Dry - IPA Vapor Dryer

Positive Photoresist removal without etching silicon, silicon dioxide, silicon nitride or SOI for nonmetal applications.

STEP 1: SPM (a.k.a. Piranha or Caro's Acid) - Quartz Static Heated Bath

STEP 2: Rinse - PVDF QDR Bath

STEP 3: SPM (a.k.a. Piranha or Caro's Acid) - Quartz Static Heated Bath

STEP 4: Rinse - PVDF QDR Bath

STEP 5: Dry - IPA Vapor Dryer

Negative removal of photoresist, metal.

STEP 1: NMP - Stainless Steel Heated Downflow Bath

STEP 2: NMP - Stainless Steel Ultrasonic Bath

STEP 3: Acetone - Stainless Steel Ambient Filtration Bath

STEP 4: IPA - Stainless Steel Ambient Filtration Bath

STEP 5: Dry - IPA Vapor Dryer

Bulk Silicon Etch.

STEP 1: Sulfuric - Quartz Static Heated Bath

STEP 2: Rinse - PVDF QDR Bath

STEP 3: KOH - Quartz Heated Filtered Bath

STEP 4: Rinse - PVDF QDR Bath

STEP 5: Dry - IPA Vapor Dryer