Closed Loop Vapor (CLV) Dryer

JST’s CLV Dryer is a combination of two proven technologies: vacuum and isopropyl alcohol (IPA) drying. The patented CLV drying technology is available as a standalone system or integrated into a JST Wet Bench. In the CLV Dryer, IPA vapor is remotely generated and introduced into the drying chamber where it mixes with and displaces the water. The vapor is then pulled out of the chamber and replaced with ultrapure nitrogen. The closed loop process provides low particle drying for blind holes, vias, and high aspect ratios while reducing IPA usage and emissions.

Typical Performance:

  • 10-20 Minute Dry Cycle depending on carrier and product type
  • 60mL average IPA consumption per drying cycle
  • Typical particle performance of < 20 adders @ 0.16um or greater per drying cycle
  • Low Vapor Emissions (less than 1 lb per day)

As with all JST wet benches, they are designed for ease of maintenance activities and comes with our standard 24/7 Technical Support.

Standard Features

  • 304L Stainless Steel shell and containment
  • 316L Electropolished Stainless Steel process chamber
  • No IPA Vapor Present during Load/Unload
  • Sealed Vessel with Closed Loop Process
  • Indirect Heating of IPA to create vapor
  • CO2 Fire Suppression System
  • Designed with a programmable logic controller (PLC) in addition to an industrial color touchscreen
  • Modular design for quick replacements and minimal down time
  • Automated Lid with two hand safety control
  • Front, side, and rear access maintenance with lift-off panels
  • Recessed dry chamber design pulls chemical fumes through the exhausted dual containment plenum
  • Meets NEC, NFPA, and FM Codes for processing with flammable solvents (IPA)
  • SEMI S2 Certification
  • CE Marked
CLV-Dryer-(3)

Optional Features 

  • Flexible dry chamber sizes available
  • Facility bulk chemical dispense of IPA
  • GEM/SECSII Factory Automation Interface
  • 3rd Party Electrical Inspections
  • Heated N2 blow-off for reduced dry cycle time
  • External High Volume vacuum pump for reduced dry cycle time
  • Available as a standalone configuration or integrated into a JST Automated Wet Bench for dry to dry processing
CLV-Dryer-(4)

Applications for CLV Dryer

  • Silicon Wafer
  • II-VI Compound Wafer
  • MEMS
  • Glass Substrates
  • Optics and more
CLV-Dryer-(5)