Pre Diffusion Clean
Removal of light organics, silicon dioxide layer, particles, metals; protective oxide regrowth
Process Steps
- STEP 1: HF (50:1) – Constant Temperature Bath
- STEP 2: Rinse – Quick Dump Rinser Bath
- STEP 3: SC1 – Heated Filtered Megasonic Bath
- STEP 4: Rinse – Quick Dump Rinser
- STEP 5: SC2 – Heated Filtered
- STEP 6: Rinse – Quick Dump Rinser Bath *Optional Megasonics
- STEP 7: Dry – STG Dryer
Process Examples
- Pre Diffusion Clean
- Nitride Etch
- Pre-Gate Clean
- Oxide Etch
- Photoresist Strip
- Metal Lift Off
- KOH Etch
- Electroless Plating
