Flexible Wet Cleaning Process Modules
Combine multiple process modules for a completely custom automated wet bench or manual wet bench configuration.
JST’s semiconductor wet cleaning process modules are designed to be integrated into any of JST’s manual or automated semiconductor wet process platforms. These modules have been specifically designed for wet process semiconductor manufacturing. Multiple modules are available for batch semiconductor processes.
Ambient Static Bath
JST’s Ambient Static Baths process modules are designed for the clean processing of acids, bases, or solvents where temperature and recirculation are not required. As with all JST process baths, coved corners and sloped bottoms provide ease of cleaning. Constructed from durable, low-maintenance materials, each Ambient Static Bath is designed with coved corners for cleanliness and a sloped bottom to assure quick, complete draining.
Constant Temperature Bath
JST’s Constant Temperature Bath maintains accurate temperature control, uniform recirculation flow, and particle removal. The chemical enters the bath from the bottom, flows evenly across the substrates, and then cascades over a four-sided weir.
Heated Downflow Bath
JST’s Heated Downflow Baths are designed for efficient metal lift-off and removal of thick films. Recirculation and filtration are provided to remove the lifted material from the bath and chemistry.
Heated Filtered Bath
JST’s Heated Filtered Bath improves chemical life and efficient particulate removal by continuously filtering the process chemicals. The chemical enters the bath from the bottom, flows evenly across the substrates, and then cascades over a four-sided weir.
Heated Static Bath
JST’s Heated Static Baths are designed to safely maintain a consistent temperature for processing with acids, bases, or solvents. The Heated Static Bath utilizes heating elements bonded to the inner walls in order temperature. As with all JST process baths, coved corners and sloped bottoms provide ease of cleaning.
JST’s Megasonic Baths produce a greater level of cleaning performance by applying high frequency energy (> 700 kHz) to effectively remove submicron particles via acoustic cavitation. JST offers heated, ambient, static, or recirculated megasonic baths and Quick Dump Rinsers, giving customers the ability to fine tune their processes.
Quick Dump Rinser
JST’s Quick Dump Rinser (QDR) process module is used to quickly remove chemicals from substrates using DI Water. This system includes comes with recipe-programmable overflow rinse, top spray, and drain/dumping capabilities.
JST’s Ultrasonic Baths are designed to enhance cleaning processes with either solvents or aqueous chemistries. Single and multiple ultrasonic cleaning frequencies are available. Bath designs utilize coved corners to eliminate particle traps, making the bath easy to keep clean.
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