Process Modules
JST’s Semiconductor Wet Cleaning Process Modules are designed to be integrated into our Manual or Automated Semiconductor Wet Process Equipment. These modules have been specifically designed for Wet Process Semiconductor manufacturing. Multiple modules are available to customize your wet bench semiconductor process.
Quick Dump Rinser
JST’s Quick Dump Rinser (QDR) is used to quickly remove chemicals from substrates using DI Water. Includes recipe programmable overflow rinse, top spray, and drain/dumping capabilities.
Ultrasonic Bath
JST’s Ultrasonic Baths are designed to enhance cleaning processes with either solvents or aqueous chemistries. Single and multiple ultrasonic cleaning frequencies are available.
Megasonic Bath
JST’s Megasonic Baths produce a greater level of cleaning performance by applying high frequency energy (> 700 kHz) to effectively remove submicron particles via acoustic cavitation.
Heated Downflow Bath
JST’s Heated Downflow Baths are designed for efficient metal lift off and removal of thick films. Recirculation and filtration are provided to remove the lifted material from the bath and chemistry.
Heated Filtered Bath
JST’s Heated Filtered Bath improves chemical life and efficient particulate removal by continuously filtering the process chemicals. The chemical enters the bath from the bottom, flows evenly across the substrates, and then cascades over a four sided weir.
Constant Temperature Bath
JST’s Constant Temperature Bath maintains accurate temperature control, uniform recirculation flow, and particle removal. The chemical enters the bath from the bottom, flows evenly across the substrates, and then cascades over a four sided weir.
Heated Static Bath
JST’s Heated Static Baths are designed to maintain uniform temperature for processing with acids, bases, or solvents. As with all JST process baths, coved corners and sloped bottom provide for ease of cleaning.
Ambient Static Bath
JST’s Ambient Static Baths are designed for clean processing of acids, bases, or solvents where temperature and recirculation are not required. As with all JST process baths, coved corners and sloped bottom provide for ease of cleaning.
