Products
IPA Dryers
JST provides two styles of IPA dryers to address solvent-drying equipment needs: a Closed Loop Vapor (CLV) dryer and a Surface Tension Gradient (Marangoni) dryer.
IPA Dryers for Optimal Wafer Processing
JST provides two styles of vapor dryers to address solvent-drying equipment needs: a Closed Loop Vapor (CLV) IPA Vapor Dryer and a Surface Tension Gradient (STG) Dryer.
In the Closed Loop Vapor CLV Dryer (CLV), the vapor is remotely generated and introduced into the drying chamber, where it mixes with the water, displacing it. The vapor is then removed from the chamber and replaced with ultrapure nitrogen. The Surface Tension Gradient Dryer (Marangoni Dryer) draws upon the Marangoni Dryer principle. As a result of the surface tension gradient, water flows off the surface of the silicon wafer, leaving the wafer dry, clean, and particle-free.
Both wafer drying options offer the best in Dry-to-Dry technology when installed in a JST Wet Bench. These dryers are designed with safety, reliability, and productivity in mind. As with all JST products, they are designed for ease of maintenance activities and come with our standard 24/7 Technical Support.
JST Wafer DRYING
IPA Vapor Dryers
JST provides two styles of vapor dryers for wafer drying: a closed loop vapor dryer and a surface tension gradient dryer which utilizes the Marangoni drying principle. Both options offer the best in Dry to Dry technology when installed in a JST Wet Bench.
Closed Loop Vapor IPA Dryer (CLV)
JST’s Closed Loop Vapor IPA Dryer (CLV) is a patented ultra-clean IPA Drying technology designed and built to provide optimal wafer drying performance. It is available as a standalone system or integrated into a wet bench. The closed loop process provides low particle drying for blind holes, vias, and high aspect ratios while reducing IPA usage and emissions.
Surface Tension Gradient IPA Dryer
(Marangoni Dryer)
JST’s Surface Tension Gradient IPA Dryer (Marangoni Dryer) is capable of vapor drying and DI Water Quick-Dump Rinsing (QDR) substrates in a single chamber. It is available as a standalone system or integrated into a wet bench. Utilizing the Marangoni Dryer Principle, the STG dryer provides the lowest particle drying of hydrophobic or hydrophilic wafers with the least IPA usage and emissions.
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