3-Axis Compact Automated Wet Bench
3-Axis Compact Automated Wet Bench
When managing space limitations and a demand for increased throughput, JST’s 3-Axis Compact Automated Wet Bench is ideal for bringing automation into current manual production cleanrooms. Its compact footprint leads the chip manufacturing industry.
- Up to 200mm product size processing capable
- Material Options: 304L stainless steel, 316L stainless steel, FM-approved PVC-C, or white polypropylene
- Internal stainless-steel frames isolated from process chemistry
- Industry-leading compact footprint
- Designed with a programmable logic controller (PLC) in addition to an industrial PC that controls the entire wet bench
- Local data logging of all process parameters and lot tracking stored on the PC’s hard drive
- Ergonomically mounted 23″ color touchscreen monitor, with JST GENII software
- Ergonomically designed front load/unload access for product cassettes
- Operation platforms include Automated Wet Benches, multi-tasking, or semi-automated operation platforms
- Compact three axes linear transfer provides stable high-speed product movement
- Front access maintenance with easy lift-off front roll panel
- Recessed bath design pulls chemical fumes through the exhausted dual containment plenum
- Compatible with any JST chemical or rinse process modules
- Combination acid, base, and solvent processing in one wet bench
- Up to 14 process modules or baths in one station section
- Dual automation platforms for increased throughput
- Rear access maintenance area provides dual containment for reservoirs, pumps, filters, and plumbing
- GEM/SECS II factory automation interface
- CO2 fire suppression system
- Nitrogen and DI water hand spray guns
- On-board chemical analyzer with integrated concentration control and monitoring for reduced chemical usage
- Dry to Dry configuration using JST’s IPA Dryers
- SEMI S2 certification
- CE marking
- 3rd party electrical inspections
- SC1 Clean
- SC2 Clean
- Nitride Etch
- Pre-Gate Clean
- Pre-Metal Clean
- Photoresist Stripping, Post Ash Clean, Post Implant Resist Strip, Post Etch Resist Strip (Optional SC1)
- Metal Lift Off
- KOH Etch
- TMAH Etching
- Aqua Regia Etching
- Silicon Wafer Etching
- Lab or fab material cleaning
- HF, DHF, BOE Oxide Etch
3-Axis Compact Automated Wet Bench Overview
JST’s 3-Axis Compact Automated Wet Bench achieves rigorous production and higher throughput with a smaller footprint. For customers managing space limitations and a demand for increased throughput, it is the ideal chemical processing wet bench for bringing automation into current manual production cleanrooms leading the chip manufacturing industry.
The 3-Axis Wet Bench can be configured to execute all wet processing methods of wafer cleaning, stripping, and etching. The system is capable of processing up to 200mm product. This platform provides excellent results for customers who require accurate, repeatable processing results while using GaAs, InP, and other compound semiconductor or silicon substrates of a smaller size. Compact three-axis linear transfer provides stable high-speed product movement.
Safely supporting the combination of processing acids, bases, and solvents in the same wet bench, this compact model features an industrial PC that controls the entire wet bench and a programmable logic controller (PLC). JST’s industry-leading three-axis platform can be customized to include 14 process modules or baths in a single station section.
As with all JST wet benches, the 3-Axis Compact Automated Wet Bench is designed for ease of maintenance activities and comes with JST’s standard 24/7 Technical Support.
