Front Linear Automated Wet Bench
Front Linear Automated Wet Bench
The Front Linear Automated Wet Bench is designed to process large wafer sizes while generating fewer particles than an overhead wet bench.
- Material Options: 304L stainless steel, 316L stainless steel, FM-approved PVC-C, or white polypropylene
- Ergonomically mounted 23″ color touchscreen monitor, with JST GENII software
- Ergonomically designed front or side load/unload access for product cassette
- Internal stainless-steel frames isolated from process chemistry
- Front access maintenance with easy lift-off hinged doors
- Rear access maintenance area provides dual containment for reservoirs, pumps, filters, and plumbing
- GEM/SECS II factory automation interface
- Automated process or transport cassette stocking
- Automated cassette-to-cassette wafer transfer (transport to process)
- Configurations for both manual operator loading or factory automation with FOUP or SMIF load ports
- Selectable notch aligner
- Pre- and post-wafer scanner
- Cross-slot detection
- Wafer mismatch alarms
- CO2 fire suppression system
- Static-eliminating de-ionizer bars provided under the HEPA filters in the wafer transfer area
- Nitrogen and DI water hand spray guns
- On-board chemical analyzer with integrated concentration control and monitoring for reduced chemical usage
- Dry to Dry configuration using JST’s IPA Dryers
- SEMI S2 certification
- CE marking
- 3rd party electrical inspections
- Pre-Diffusion Clean
- Nitride Etch
- Pre-Gate Clean
- Pre-Metal Clean
- Photoresist Strip, Post Ash Clean, Post Implant Resist Strip, Post Etch Resist Strip (Optional SC1)
- Metal Lift Off
- KOH Etch
- TMAH Etching
- Aqua Regia Etching
- Silicon Wafer Etching
- Lab or fab material cleaning
- HF, DHF, BOE Oxide Etch
Front Linear Automated Wet Bench Overview
The The Front Linear Automated (FLA) has the capability to run up to two cassettes/50 wafers. This chemical wet bench allows for accurate process control, high throughput, and production flexibility in a cleanroom environment. Its dual-rail front linear transfer guarantees rapid product movement and ensures high throughput. By providing simultaneous multiple-lot processing with a variety of adjustable parameters, this system is designed to maximize the use of laboratory space and time.
Compatible with any JST chemical or rinse process modules, the FLA supports semi-automated or automated operation with a variety of integrated wafer input and output requirements. The Front Linear Automated wet bench is equipped with look-ahead scheduling software, a feature that allows processing of multiple lots with unique recipes at the same time. This multitasking capability saves time, floor space, and chemical usage.
JST’s Front Linear Automated wet bench meets the requirements for a Class 100 Cleanroom (ISO Class 3). The FLA is designed with ergonomic front or side load/unload access for product cassettes. To ensure a safe and well-controlled work area, the recessed bath design of this wet bench pulls chemical fumes through the exhausted dual containment plenum, assisted by integrated HEPA filters.
As with all JST wet benches, the Front Linear wet bench is designed for ease of maintenance activities and comes with our standard 24/7 Technical Support.
