Photoresist Stripper
Photoresist Stripper
The objective of JST’s photoresist stripper is to eliminate the photoresist material from the wafer as quickly as possible, without allowing any surface materials under the resistance to get attacked by the chemicals used.
- STEP 1: SPM (Sulfuric Peroxide) Dirty in a Quartz Heated Filtered Bath
- STEP 2: SPM (Sulfuric Peroxide) Clean in a Quartz Heated Filtered Bath
- STEP 3: Rinse – Quick Dump Rinser
- STEP 4: Dry – Surface Tension Gradient Dryer (Marangoni Dryer)
Photoresist Stripper Overview
Photoresist Stripper | Post Ash Clean | Post Implant Resist Strip | Post Etch Resist Strip | Optional SC1 | Piranha Quartz Heated
In the Photoresist Stripper process, otherwise referred to as ‘resist stripping,’ removes unwanted photoresist layers are removed from the wafer. Its objective is to eliminate the photoresist material from the wafer as quickly as possible, without allowing any surface materials under the resist to get attacked by the chemicals used.
Several wafer cleaning techniques, or steps, are employed to ensure that a semiconductor wafer is always free of contaminants and foreign materials as it undergoes the wafer fabrication process. Different contaminants have different properties and therefore have different requirements for removal from the wafer.
Wet inorganic strippers, which are also known as oxidizing-type strippers, are used for inorganic stripping, usually to remove photoresist from non-metalized wafers, as well as post-baked and other hard-to-remove resists. Inorganic strippers are sulfuric acid solutions and an oxidant (such as hydrogen peroxide), heated to about 150°C. JST accomplishes this task by using quartz baths equipped with mat heaters capable of precise temperature control and quartz wafer carriers.
JST’s Class 10 Applications Lab enables our customers to develop processes using real-world tools, process modules, and chemicals. This, coupled with our partnerships with various chemical vendors, allows JST to collaborate and develop cleaning solutions for our customers.
All of JST’s wet benches and lab furniture are designed with safety, reliability, and productivity in mind. Our wet processing benches are modular and meet all Semi, CE, NFPA, and OSHA requirements. All cleanroom furniture is designed for safe, convenient, clean, and efficient performance in cleanroom environments Our expertise in manufacturing wet benches, cleanroom furniture, and accessories includes onsite plastics and metal fabrication as well as mechanical and electrical assembly.
As with all JST wet benches, the Photoresist Stripper is designed for ease of maintenance activities and comes with our standard 24/7 Technical Support.
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