Rear Linear Automated Wet Bench
Rear Linear Automated Wet Bench
JST offers the Rear Linear Automated Wet Bench as a low-cost option for automated chemical processing for managing safe, high-quality, high-volume production.
- Material Options: 304L stainless steel, 316L stainless steel, FM-approved PVC-C, or white polypropylene
- Internal stainless steel frames isolated from process chemistry
- Designed with a programmable logic controller (PLC) in addition to an industrial PC that controls the entire wet bench
- Local data logging of all process parameters and lot tracking stored on the PC’s hard drive
- Ergonomically mounted 23″ color touchscreen monitor, with JST GENII software
- Ergonomically designed front or side load/unload access for product cassettes
- Automated, multi-tasking, or semi-automated operation platforms
- Rear-mounted linear transfer provides stable high-speed product movement
- Front access maintenance with easy lift-off hinged doors
- Front-mounted reservoirs, pumps, filters, and plumbing in the dual containment plenum
- Recessed bath design pulls chemical fumes through the exhausted dual containment plenum
- Compatible with any JST chemical or rinse process modules
- GEM/SECS II factory automation interface
- Automated process or transport cassette stocking
- Automated cassette-to-cassette wafer transfer (transport to process)
- Configurations for both manual operator loading or factory automation with FOUP or SMIF load ports
- Selectable notch aligner
- Pre- and post-wafer scanner with cross slot detection and wafer mismatch alarms
- CO2 fire suppression system
- Integrated HEPA filters provide an ultra-clean process environment
- Static-eliminating de-ionizer bars provided under the HEPA filters in the wafer transfer area
- Nitrogen and DI water hand spray guns
- On-board chemical analyzer with integrated concentration control and monitoring for reduced chemical usage
- Dry to Dry configuration using JST’s IPA Dryers
- SEMI S2 certification
- CE marking
- 3rd party electrical inspections
- Pre-Diffusion Clean
- Nitride Etch
- Pre-Gate Clean
- Pre-Metal Clean
- Photoresist Stripping, Post Ash Clean, Post Implant Resist Strip, Post Etch Resist Strip (Optional SC1)
- Metal Lift Off
- KOH Etch
- TMAH Etching
- Aqua Regia Etching
- Silicon Wafer Etching
- Lab or fab material cleaning
- HF, DHF, BOE Oxide Etching
Rear Linear Automated Wet Bench Overview
The Rear Linear Automated Wet Bench (RLA) supports automated, semi-automated, or multitasking operations with a variety of integrated wafer input and output requirements. This chemical wet bench allows for accurate process control, high throughput, and production flexibility by providing multiple lot processing simultaneously with various processing parameters.
The RLA is configured with front-mounted reservoirs, pumps, filters, and plumbing in the dual containment plenum. This system is designed with ergonomic front or side load/unload access for product cassettes. With both SMIF and FOUP load port options, the bench ensures that wafers are transferred in a safe and well-controlled manner.
As with all JST wet benches, this product is designed for ease of maintenance activities and comes with our standard 24/7 Technical Support.
