Transforming Single-Wafer
Wet Processing

For more than four decades, JST has been a trusted provider of wet processing solutions for global semiconductor fabs, R&D centers, and optoelectronic device manufacturers. With its newest innovation—the Ospray single-wafer wet processing platform—JST is setting a new benchmark for flexibility, efficiency, and sustainability in wafer processing.

In this white paper, you’ll learn how Ospray:

• Redefines cost of ownership: Significant chemical, water, and energy savings while optimizing cleanroom space.
• Delivers unmatched flexibility: Scales from 4 to 16 chambers, uniquely integrates single-wafer and batch processes on the same platform.
• Supports next-generation applications: Precision and uniformity for optoelectronics, CMOS back-end-of-line, high-performance computing & AI infrastructure.
• Advances process control: Patented three-arm design, support for up to nine chemistries, and a roadmap toward AI-driven process optimization.
• Drives sustainability: Reduced chemical and water consumption, lower energy demand, and simplified reclaim and recycling.

With Ospray, JST is bridging the gap between batch and single-wafer processing, giving fabs the ability to meet today’s demands while preparing for tomorrow’s scaling and integration challenges.