Rear Linear Automated (RLA) Wet Bench

Designed as a low cost option for automated chemical processing, JST’s Rear Linear Automated (RLA) Wet Bench works well with high volume production at an affordable price.  This chemical wet bench allows for accurate process control, high throughput and production flexibility by providing multiple lot processing simultaneously with a variety of processing parameters.

The RLA supports semi-automated or automated operation with a variety of integrated wafer input and output requirements.  As with all JST wet benches, they are designed for easy maintenance activities and comes with our standard 24/7 Technical Support.

Standard Features

  • Material Options:  304L Stainless Steel, 316L Stainless Steel, FM Approved PVC-C, or White Polypropylene
  • Internal Stainless Steel frames isolated from process chemistry
  • Designed with a programmable logic controller (PLC) in addition to an industrial PC that controls the entire wet bench
  • Local data logging of all process parameters and lot tracking stored on the PC’s hard drive
  • Ergonomically mounted 23” Color Touchscreen Monitor, with JST GENII Software
  • Ergonomically designed front or side load/unload access for product cassettes
  • Automated, Multi-tasking, or Semi-Automated operation platforms
  • Rear Mounted Linear Transfer provide stable high speed product movement
  • Front access maintenance with easy lift-off hinged doors
  • Front mounted reservoirs, pumps, filters, and plumbing in the dual containment plenum
  • Recessed bath design pulls chemical fumes through the exhausted dual containment plenum
  • Compatible with any JST chemical or rinse process modules [link to process modules]
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Optional Features 

  • GEM/SECSII Factory Automation Interface
  • Automated process or transport cassette stocking
  • Automated cassette to cassette wafer transfer (transport to process)
  • Configurations for both manual operator loading or factory automation with FOUP or SMIF load ports
  • Selectable Notch Aligner
  • Pre and Post Wafer scanner  with Cross Slot Detection and wafer mismatch alarms
  • CO2 Fire Suppression System
  • Integrated HEPA filters provides an ultraclean process environment
  • Static eliminating de-ionizer bars provided under the HEPA filters in the wafer transfer area
  • Nitrogen and DI Water Hand Spray Guns
  • On-board chemical analyzer with integrated concentration control and monitoring for reduced chemical usage
  • Dry to Dry configuration using JST’s IPA Dryers
  • SEMI S2 Certification
  • CE Marking
  • 3rd Party Electrical Inspections
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Applications For Rear Linear Automation (RLA) Wet Bench

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